Películas delgadas de nitruro de aluminio (ALN)
DOI:
https://doi.org/10.22517/23447214.1291Abstract
Este documento pretende hacer una revisión de las principales características estructurales y morfológicas del nitruro de aluminio –AlN- específicamente cuando este es depositado por Magnetrón Sputtering ó por medio de Ablación Láser (PLD). Igualmente como influyen los parámetros de crecimiento como presión de gas ambiente (N2), temperatura de sustrato o tiempo de deposición en la calidad y orientación cristalina de las películas delgadas de AlN.Downloads
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