Síntesis de TiN y TiC por la técnica de PAPVD arco pulsado


Authors

  • Diego F. Devia Narvaez Universidad Tecnológica de Pereira
  • Francisco J. O. Escobar González
  • Harold DuqueSánchez

DOI:

https://doi.org/10.22517/23447214.8191

Keywords:

PAPVD, TiN, TiC, XRD, XPS.

Abstract

Los recubrimientos de TiN y TiC se depositaron utilizando la técnica de deposición en fase vapor asistido por plasma (PAPVD)-Arco Pulsado, variando la temperatura del sustrato en valores de 85-100-115°C. Los recubrimientos se analizaron por medio de Dispersión de Fotoelectrones de Rayos X (XPS)) y Difracción de Rayos X (XRD). A partir del tratamiento de las señales de los espectros angostos de XPS y los patrones de XRD, se determinó la formación de los compuestos TiN (Nitruro de Titanio), TiC (Carburo de Titanio) con grupo espacial fm-3m correspondiente a las fases FCC de los compuestos sintetizados.

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Published

2012-12-30

How to Cite

Devia Narvaez, D. F., Escobar González, F. J. O., & DuqueSánchez, H. (2012). Síntesis de TiN y TiC por la técnica de PAPVD arco pulsado. Scientia Et Technica, 1(52), 150–154. https://doi.org/10.22517/23447214.8191

Issue

Vol. 1 No. 52 (2012)

Section

Ciencias Básicas

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