Propiedades de las Peliculas de TiN/TiC Crecidas por la Técnica de Arco Pulsado
DOI:
https://doi.org/10.22517/23447214.8405Keywords:
TiN/TiC, Interface, PAPVDAbstract
Los recubrimientos de TiN/TiC fueron depositados por la técnica de Deposición Física en Fase de Vapor asistida por Plasma (PAPVD) por Arco Pulsado. Los recubrimientos fueron analizados por Espectroscopia de fotoelectrones de Rayos X (XPS) y Difracción de Rayos X (XRD). El tratamiento de la señal del espectro angosto XPS y los patrones XRD confirmaron la presencia de TiN (Nitruro de Titanio), TiC (Carburo de Titanio) y TiCN (Carbonitruro de titanio), con grupo espacial fm-3m, correspondiente a la fase FCC de los compuestos sintetizados.Downloads
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