Curvas de presión para el crecimiento de recubrimientos de TiAlN por la técnica Magnetrón Sputtering Tríodo


Authors

  • DIANA MARCELA DEVIA NARVAEZ UNIVERSIDAD TECNOLOGICA DE PEREIRA
  • DIEGO FERNANDO DEVIA NARVAEZ
  • HAROLD DUQUE SANCHEZ

DOI:

https://doi.org/10.22517/23447214.8749

Keywords:

Curvas de Presión, Histéresis, Magnetrón Sputtering Tríodo, Microestructura, TiAlN.

Abstract

Se depositó recubrimientos de Nitruro de Titanio (TiAlN) por medio de la técnica Magnetrón Sputtering Tríodo variando la presión. El análisis se realizó aumentando y disminuyendo la presión de trabajo, para determinar las curvas de presión. Estas curvas se realizaron en una atmosfera de N2/Ar y utilizando un blanco de Titanio-Aluminio. Se observó un cambio en la microestructura a partir de los análisis de difracción de rayos X.

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Published

2013-12-30

How to Cite

DEVIA NARVAEZ, D. M., DEVIA NARVAEZ, D. F., & DUQUE SANCHEZ, H. (2013). Curvas de presión para el crecimiento de recubrimientos de TiAlN por la técnica Magnetrón Sputtering Tríodo. Scientia Et Technica, 18(4), 646–650. https://doi.org/10.22517/23447214.8749

Issue

Vol. 18 No. 4 (2013)

Section

Mecánica

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