Curvas de presión para el crecimiento de recubrimientos de TiAlN por la técnica Magnetrón Sputtering Tríodo
DOI:
https://doi.org/10.22517/23447214.8749Keywords:
Curvas de Presión, Histéresis, Magnetrón Sputtering Tríodo, Microestructura, TiAlN.Abstract
Se depositó recubrimientos de Nitruro de Titanio (TiAlN) por medio de la técnica Magnetrón Sputtering Tríodo variando la presión. El análisis se realizó aumentando y disminuyendo la presión de trabajo, para determinar las curvas de presión. Estas curvas se realizaron en una atmosfera de N2/Ar y utilizando un blanco de Titanio-Aluminio. Se observó un cambio en la microestructura a partir de los análisis de difracción de rayos X.
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